Analysis
Renesas Technology Has Adopted Synopsys Proteus OPC for 28-nm Development
Synopsys announced that Renesas Technology Corp., the world's No. 1 supplier of microcontrollers and one of the world's leading semiconductor system solutions providers for mobile, automotive and PC/AV (Audio Visual) markets, has adopted Synopsys Proteus optical proximity correction (OPC) for 28-nanometer (nm) development. The 28-nm node pushes the limits for single-exposure photon-based lithography, and by selecting Proteus, Renesas can achieve their aggressive OPC accuracy specifications with improvement of process robustness. Proteus' advanced frequency domain simulators, highly scalable OPC engine and compact physical models offer unmatched accuracy, runtime performance and cost of ownership on industry-standard hardware.
ProcBy optimizing the lithography simulation engine for standard x86 architecture, Proteus helps customers manage turnaround time with the lowest cost of ownership. Unlike software designed for custom hardware, Proteus takes advantage of the 1.6x performance improvement of each x86 generation. Through a combination of these ongoing microprocessor advancements and algorithmic enhancements, Proteus has delivered more than 12x better performance over the last three years.
Renesas' success using Proteus to deploy their 28-nm OPC flow once again validates that Proteus delivers to our customers the best combination of accuracy and runtime performance, said Howard Ko, senior vice president and general manager of the Silicon Engineering Group at Synopsys. By working with an industry leader like Renesas, Synopsys is able to deliver the industry's most advanced solutions, and we look forward to our continued collaboration.