Plasma Therm provides UCF with etch capabilities

17th March 2015

Plasma-Therm

Jordan Mulcare

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Plasma Therm’s Advanced Vacuum division was recently selected by the University of Central Florida to provide enhanced compound semiconductor etch and dielectric deposition capabilities. UCF’s College of Optics and Photonics, provides research facilities for users from universities and industry locally and internationally from a wide range of disciplines.

In addition to serving a key role in the university’s academic mission, the centre encourages the commercialisation of internal and external research efforts. The advanced vacuum APEX SLR etching system combines Plasma-Therm’s Shuttlelock plasma reactor technology with the cost-effective APEX platform. The recently installed APEX SLR complements CREOL’s Plasma-Therm equipment.

Deposition capability at CREOL will soon be enhanced by an Advanced Vacuum Vision 310 system, which compliments Plasma-Therm's plasma-enhanced chemical vapor deposition system. These systems will be used to generate lightemitting, detecting, modulating and guiding devices required for “chip-to-chip” communication at today’s and tomorrow’s information transfer rates.

“The decision to select Advanced Vacuum’s APEX and Vision systems was based on several factors, including the high quality and reliability of the products, very competitive quotes for the required specs, the company’s reputation and their long partnership with UCF,” said Professor Sasan Fathpour, CREOL.

“We are thankful to the National Science Foundation and the Office of Naval Research for providing grants that led to the purchase of these tools. These systems contribute to CREOL’s Nanophotonics Systems Fabrication Facility capabilities for conducting advanced academic research and basic industrial R&D in integrated photonics, and better position the college to compete for research opportunities in areas such as heterogeneous photonics,” added Fathpour.