IM makes key US appointment to drive commercialisation

Irresistible Materials was founded in 2010 to develop novel fullerene materials for applications in lithography which will help overcome roadblocks in the development of the next generation of semiconductors. The company has developed a comprehensive intellectual property portfolio, with over a dozen patents covering fullerene materials and processes for applications including EUV resists, Spin-on-Carbon, and e-beam resists, which will be critical for computer chip manufacturers to fabricate ever-smaller features for microelectronic devices. Irresistible Materials now works in alliance with Nano-C Inc (US).

Warren Montgomery, who previously worked at the College of NanoScale Science and Engineering (CNSE) in Albany NY, where he was Assistant Vice President of Technical and Consortia Program Development, joins the company at a critical stage in its development. 

He commented: “EUV lithography is moving toward high-volume manufacturing (HVM) for advanced semiconductor chip production. A key need continues to be high performance photoresists. Irresistible Materials has developed a low cost of ownership, high resolution, and low dose photoresist that represents a new and exciting approach to HVM patterning. I am looking forward, with great enthusiasm, to this opportunity to work with the team to help commercialize this exciting technology.”

Mark Shepherd, CEO of Irresistible Materials, said: “We are delighted to welcome Warren to Irresistible Materials.  His expertise and experience in our industry gives valuable depth to our expanding team that includes our key development partner and chemicals supplier, Nano-C, Inc. These have been important steps in building our capabilities over recent months and Irresistible Materials is now well placed to bring its cutting edge resist and hard mask products to the market place in time for the introduction of EUV lithography”.