Breakthrough ruthenium film deposition process

TANAKA Kikinzoku Kogyo K.K., which operates the TANAKA Precious Metals manufacturing business, has announced that TANAKA has established a two-stage film deposition process using the liquid ruthenium (Ru) precursor 'TRuST'.

TRuST is a precursor that has excellent reactivity with both oxygen and hydrogen and can form high-quality ruthenium films. This process is a two-stage ALD (atomic layer deposition) process that uses hydrogen film formation to create a thin anti-oxidation film and oxygen for the deposition of a high-quality ruthenium film. The method eradicates concerns that the substrate will become oxidised and, at the same time, can prevent the drop in ruthenium purity that occurs during hydrogen film deposition.

The film deposition process was proposed by Professor Soo-Hyun Kim from the School of Materials Science and Engineering, College of Engineering, Yeungnam University in South Korea. The development and evaluation of the film deposition process were jointly conducted by Professor Kim and TANAKA Kikinzoku Kogyo.

This technology is expected to achieve greater miniaturisation and improved durability of semiconductors. It can therefore be expected to be used in data centers and smartphones, which require even greater data processing capabilities, and contribute toward advanced technologies such as IoT and autonomous driving, which require sophisticated technological innovations.

More information can be found at the original news piece here.

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About TANAKA Precious Metals Since its foundation in 1885, TANAKA Precious Metals has built a portfolio of products to support a diversified range of business uses focused on precious metals. TANAKA is a leader in Japan regarding the volumes of precious metals handled. Over the course of many years, TANAKA has not only manufactured and sold precious metal products for industry but also provided precious metals in such forms as jewelry and assets.