Plasma etch system expands device processing capability at NASA's JPL

These systems are used to make critical components for NASA explorations, including detectors to map background cosmic radiation for better understanding of the universe’s beginnings, solid- state lasers used in detection of carbon dioxide and methane on Earth, Mars and other planets, and infrared sensor arrays for terrestrial and extraterrestrial imaging.

The MDL has a multitude of both internal and external users, and thus, Apex’s ease of operation and the system’s reliability are important performance requirements. Recently, the Apex SLR and other systems were on display to the nearly 14,000 attending JPL’s annual open house. Visitors enthusiastically observed the processing technologies used to make the sensors and devices.

Industrial fabrication facilities are usually designed for mass production using a single set of standard processes. However, operations at MDL, which develops unique devices for space applications, must be much more versatile, involving research, development and small-scale production of a broad range of devices, wafer sizes, wafer thicknesses and material families.

The Apex SLR provides the capabilities that MDL and other research facilities need to process a variety of materials, including dielectrics, metals, polymers, compound semiconductors and superconducting materials. The recently installed Apex system is process-qualified with fluorine-based chemistries to etch dielectrics and superconducting materials.

Dr. David Lishan, Principal Scientist and Director, Technical Marketing, Plasma-Therm, commented: “Our relationship with NASA's JPL goes back many years and we are quite pleased that we continue to meet the needs of such a prestigious organisation. With each system that is used to make new sensors and high-performance devices, we anticipate being part of exciting and often unexpected science - science that often dramatically changes what we know about and how we view our planet, solar system and the universe.”