Search results for "Photonic Microsystems"
Photon Introduces NanoScan v2, Enhanced User Interface for Scanning Slit Laser Beam Profiler
Photon today announced NanoScan v2, the newest version of the company's scanning slit beam profiler. NanoScan is a NIST-calibrated laser beam profiler. The system uses moving slits to measure beam sizes from microns to centimeters at beam powers from microwatts to kilowatts, with little to no attenuation. The new version adds an enhanced graphical user interface (GUI) with support for the Microsoft Windows ribbon toolbar. Dockable and floatable w...
Patterning defect-free nanocrystal films with nanometer resolution
Films made of semiconductor nanocrystals — tiny crystals measuring just a few billionths of a meter across — are seen as a promising new material for a wide range of applications. Nanocrystals could be used in electronic or photonic circuits, detectors for biomolecules, or the glowing pixels on high-resolution display screens. They also hold promise for more efficient solar cells.
Jenoptik’s Lasers & Material Processing division wins an order for diode lasers worth 2.7 million US dollars.
Continuing strong demand for Jenoptik lasers used in medical technology. Jenoptik is in international demand as a supplier in the area of lasers and material processing.
High Power High Efficiency 1550nm Eye Safe Laser Diodes
Intense Ltd., developer of next generation semiconductor lasers, systems and solutions, today announced the new Series 2400 eye safe laser diodes at World of Photonics 2009 in Munich. The Series 2400 are 1550nm short pulsed single emitters and stacks that have been redesigned for higher power and efficiency. The single emitters are available in 75µm to 150µm junction lengths, with power levels of 6W to 12W. Individual emitters can be stacked in...
Hamamatsu Photonics announces the ORCA-D2 Dual CCD Camera with Interchangeable Optical Blocks for Simultaneous Dual Wavelength Imaging
Hamamatsu Photonics has announced that in spring 2010, they will release the new ORCA-D2, a new high-sensitivity camera for simultaneous dual wavelength imaging that features two CCD devices and interchangeable optical blocks.
New LED from Hamamatsu for POF Data Communication
Hamamatsu Photonics introduce the new L10762 resonant cavity LED for POF (Plastic Optical Fibre) data communication. The new L10762 is a red emitting resonant cavity LED that offers 7 times the fibre end output power compared to conventional types; this is achieved by bonding a microball lens to the LED chip surface. The microball lens greatly increases the coupling efficiency to optical fibres by focusing the emitted light into the fibre.
Intense Ltd. Announces Higher Power MIL SPEC QCW Bars & Stacked Arrays to 3kW
Intense Ltd., developer of next generation semiconductor lasers, systems and solutions, today announced at Photonics West an expanded range of high power QCW bars and stacked array products. The new Hermes Stacked Array line now includes higher power QCW laser diodes, ranging from 600 to 3,000W, qualified to MIL-Standards. In addition, Intense provides passively mounted QCW Bars with power levels ranging from 100 to 400W.
Hamamatsu Photonics 2D InGaAs Image Sensor
Hamamatsu Photonics introduced the G11097-0606S, a brand new two dimensional InGaAs image sensor that compliments the existing range of high performance linear image sensors. The G11097-0606S consists of a CMOS readout integrated circuit (ROIC) and a back illuminated InGaAs photodiode array, which are connected via indium bumps on a hybrid structure. The G11097-0606S features simultaneous charge integration and a 5MHz video data rate. Also includ...
EV Group Signs Collaboration Agreement with Eulitha to Establish Low-Cost-of-Ownership Nanopatterning Solutions for HB-LED Manufacturing
EV Group announced that it has signed a joint-development and licensing agreement with Eulitha AG, a pioneer and leader in the production of high-quality nanostructures using advanced lithography techniques. EVG will integrate Eulitha's PHABLE mask-based ultraviolet (UV) photolithography technology with EVG's automated mask aligner product platform with the goal of developing a low-cost-of-ownership (CoO) nanopatterning solution to enable the pr...
RIBER and TRUMPF start collaboration on next-generation III-V high power semiconductor lasers
Riber today signed an agreement with TRUMPF to collaborate on epitaxy process technologies for next-generation III-V high power laser devices. The agreement follows a successful process qualification at the Ferdinand Braun Institut, Berlin (Germany).