NIR enhanced image sensor boasts 300fps at full resolution

The NIR enhanced CMV12000 version is processed on 12 um epi Si wafer starting material. This epi layer is 7 µm thicker than on the “standard wafers” and significantly increases the QE for wavelengths above 600 nm. At 825 nm the QE is almost twice the QE on 5 um epi Si wafers, increasing from 15% to 30% for the monochrome part    

"We are very happy to offer this  NIR enhanced CMV12000/300FPS version," said Lou Hermans, Chief Operating Officer, CMOSIS. " We see growing demand for our CMV2000 and CMV4000 NIR enhanced imagers for image acquisition outside the visual wavelength range, in particular for machine vision and traffic applications.  The introduction of this new imager is the next logical step to support customers in this field."

The CMV12000 NIR is available today in sample volumes. Volume orders and shipments  will be supported towards the end of 2014.