Advanced Energy announces RF power delivery solution

Designed for thin-film industrial applications, the ALTA  platform ensures versatile, accurate and repeatable control that enhances process stability and provides good yield.

The ALTA platform includes a 13.56MHz rack-mounted power supply with power levels from 1.5kW to 6kW and a 13.56MHz tapped digital matching network. The series is optimised for plasma-based industrial processes demanding accurate, reliable and repeatable precision power delivery, including solar panel, flat panel display, precision optics and automotive glass manufacturing.

“As thin-film manufacturing technologies evolve and rapid plasma transitions become the norm, there is a growing demand for power solutions that combine precise RF control with dynamic response to rapid plasma changes,” said Dhaval Dhayatkar, Senior Director of Marketing, Plasma Power at Advanced Energy. “The ALTA power supply offers several advanced features including frequency tuning, real-time power and impedance measurement, tight power regulation, arc management and phase synchronisation.”

The ALTA power supplies incorporate full digital control and dynamic response to rapid plasma changes to ensure robust and reliable delivery. The ALTA matching network provides tuning versatility with a tapped coil system that can be easily adjusted to accommodate a variety of impedance ranges. Repeatable response minimises delivered power deviations both between matches and run-to-run under a variety of operating conditions.

By utilising advanced digital architecture, the ALTA platform enables extremely precise process measurement and control, as well as seamless system integration with communication interfaces such as EtherCAT and Profinet.