Optoelectronics
Ultratech Introduces Superfast 3G CGS Inspection System For Use In Front-, Middle- And Back-end-of-line Production
Ultratech, Inc. today introduced its new in-line wafer inspection system, the Superfast 3G, which provides the flexibility to address a wide range of applications including improved overlay control and enhanced yield. The system has the flexibility to be implemented anywhere in the production line―front-, middle- and back-end-of-line―to address issues confronting leading-edge device manufacturers.
At aUltratech Vice President of Technology and Chief Technologist for Surface Inspection Dave Owen explained, Ultratech has had this technology for a while and has worked with customers to improve its capabilities. These customers concluded that this inspection capability was critical to improving overlay control, device performance and yield. The Superfast 3G takes an enormous amount of data in a short span of time and creates detailed wafer maps. Without the need for a dedicated target, this production system can measure both patterned and blanket wafers at any stage in the process flow. The CGS technology provides a high degree of flexibility that enables our customers to use a single type of wafer inspection tool across the entire fab line. Also, the Superfast 3G is a low cost-of-ownership and cost-per-point solution compared to competing systems. We are excited to introduce our flexible Superfast 3G in-line, wafer inspection solution to the industry.