Veeco’s etch tool selected for 5G RF filter

5G RF filters enable mobile broadband connection of mobile devices, wireless machine-to-machine communication and radar systems typically used in autonomous driving applications. The Lancer system will be used to etch piezoelectric materials, the key technology in next generation RF filters, sensors and actuators. “Throughout our interactions with Veeco, it has become apparent that their ion beam etch capabilities, unique expertise and close collaboration  with us will provide clear advantages for our efforts here at Silicon Austria Labs,” commented SAL’s Mohssen Moridi, Ph.D., Head of Research Unit Microsystem Technologies. “In addition to the system’s ease-of-use, process flexibility and exceptional performance, the service and support offered by the Veeco team has made a strong impression on our group.”

The Lancer Ion Beam Etch System was designed for the development and production of next generation electronic devices found in 5G RF Filters, smartphones, self-driving automobiles and other ‘internet-of-things’ devices that enable superior connectivity, functionality and mobility.

“We are proud to have been selected by Silicon Austria Labs, an innovative leader in future-oriented solutions for electronic-based systems,” commented Adrian Devasahayam, Ph.D., Veeco’s Senior Vice President, Product Line Management. “The Lancer IBE system is built on a production-proven platform with its patented tunable ion source technology providing unmatched process performance on 200 millimeter wafer substrates required for next generation RF devices.  With over 300 ion beam systems in the field, we believe our ion beam etch technology is well-suited to handle rigorous demands for devices that require piezoelectric materials.  We look forward to supporting SAL’s research excellence and positive economic impact.”