Home > Products > Samsung DFM Ready for 20 nm Based on Mentor Graphics Calibre Platform

Design

Samsung DFM Ready for 20 nm Based on Mentor Graphics Calibre Platform

2nd March 2012

ES Admin

0 0

Mentor Graphics Corporation today announced that Samsung Electronics and Mentor have successfully delivered a complete design-for-manufacturing (DFM) sign-off reference solution for Samsung’s foundry customers based on the Calibre platform. The DFM sign-off solution is available for world class consumer and telecommunications designs targeting advanced process nodes. Samsung has already released the Calibre kits to their customers for 32 nm and 28 nm, and has completed evaluation for 20 nm.

“We have been working closely with Mentor to provide a comprehensive and consistent ecosystem for our customers,” said Kee Sup Kim, vice president of Infrastructure Design Center, Samsung Electronics. “We have used Mentor’s 32/28 nm DFM solution on several advanced SoCs to reduce late-stage problems that could lead to delayed product releases or slower than expected yield ramp-up. We are currently working with Mentor to expand the DFM solution to 20 nm processes as well.”

The components of the Calibre DFM platform at Samsung include the Calibre LFD™ product for litho simulation and hot spot pattern identification; the Calibre nmDRC and Calibre PM products for pattern-based design rule and hot spot checking and fixing; and the Calibre YieldAnalyzer product, which is used in conjunction with the Samsung manufacturing analysis deck for DFM scoring and critical area analysis (CAA).

“At advanced nodes, proper incorporation of DFM techniques can create a competitive edge for both foundries and fabless designers,” said Joseph Sawicki, vice president and general manager for the Design-to-Silicon Division at Mentor Graphics. “We are pleased to be working with Samsung on the Calibre platform to provide this competitive edge to our mutual customers.”