Ultra-pure gas increases the yield in the fab

This highlights the need for increased yield in fabs, which is directly affected by the number of wafer defects occurring during manufacture. Since these defects are commonly introduced by impurities in the production gases, monitoring gas purity can help to optimise the efficiency of manufacturing.

Ultra-Pure Gas for Higher Yield: Gas Analysis for Semiconductor Manufacturing – a webinar by Thermo Fisher Scientific, explains the basics of analysing high purity gases, and how to choose the right gas analyser for your facility, as well as optimal installation locations.

Production of semiconductors can be divided into three stages: design, front-end, and back-end. Most of the defects are introduced during the front-end stage, and ultra-pure gases are at the heart of this manufacturing step; they are used in numerous processes including deposition, etching, doping, and purging of equipment. Unfortunately, if the gases have impurities, these can attach directly to the wafers, creating imperfections that can render the chips unusable. It is therefore crucial to monitor the purity of the gases to avoid unnecessary costs and lower yields.

Thermo Fisher Scientific has a long experience working alongside the semiconductor industry, helping companies to maximise their throughput and push the boundaries of innovation.

The cornerstones of this movement are the Thermo Scientific APIX δQ and Thermo Scientific APIX Quattro instruments, offering contamination detection limits of ppt per impurity.

Strategic placement of these analysers will allow fabs to take advantage of the systems’ unparalleled sensitivity to provide accurate monitoring of gas purities.