E-beam lithography system features at MNE show

24th September 2018

Mick Elliott

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Leading semiconductor test equipment supplier Advantest will feature its F7000 EB (electron beam) lithography system and other nanotechnology-ready equipment at the Micro and Nanoengineering (MNE) show in Copenhagen (September 25-27). The MNE program and exhibition covers current and relevant activities in micro- and nanoengineering.

The F7000 EB lithography system delivers high throughput and creates very accurate and smooth nano-patterns on wafers from 1X-nm resolution. Its direct-write technology makes it well suited as a design tool for research and development as well as a solution for LSI production lines, where small-lot-multiple-type devices are produced.

Using character projection technology, the system offers high throughput for both prototyping and production.

Advantest’s portfolio of nanotechnology solutions also includes several other products. The E3310 and E3640 Multi Vision Metrology Scanning Electron Microscope (MVM-SEM^®) systems enable real-time, 3D measuring and imaging of wafers and masks. For tri-gate processes, the E3310 Wafer MVM-SEM offers high efficiency for volume production.

The E3640 Mask MVM-SEM system delivers the industry’s best pattern-measurement capability and high throughput for applications including standard photomasks, EUV photomasks and NIL templates.

The E5610 Mask DR-SEM is designed for reviewing and classifying ultra-small defects in next-generation photomasks and blanks. The system offers highly stable, fully automatic image capturing with the long-term operational stability and reliability essential for manufacturing analyses of critical masks.