Events News
Conference's 3rd session explores process enhancement & control
The 'High-Reliability Cleaning and Conformal Coating Conference', 18th to 20th November in Illinois, USA, focuses on best practices and innovative technologies for meeting manufacturing challenges and producing reliable hardware. The conference's 3rd session, 'Cleaning Process Enhancement and Control to Promote Process Efficiency and Product Integrity', will be chaired by Mike Konrad of Aqueous Technologies.
Speakers in this session will include:
- Dave Adams, Rockwell Collins, will discuss 'In-line Aqueous Cleaning System Wash Sump Solution Life Extension';
- Umut Tosum, Zestron, will present 'Concentration Monitoring Control in Batch and Inline Cleaning Machines';
- Ram Wissel, Kyzen, will explore 'Research on a method for real time values for wash concentration and soil levels in aqueous cleaning processes'; and
- Scott Nelson, Harris, will discuss 'Monitoring, storing and logging critical wash parameters real time'.
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