E-beam lithography tool debuts at Semicon Europa
Advantest is preparing to exhibit its broad portfolio, including its nanotechnology products, terahertz systems and semiconductor test solutions at SEMICON Europa in Grenoble (October 7-9). It will highlight its multi-vision CD-SEM metrology solutions and newest e-beam lithography tool.
The company’s e-beam lithography tool delivers outstanding resolution and accuracy at high writing speeds while its CD-SEM system provides significantly improved measurement accuracy and throughput.
Also debuting are Advantest’s new terahertz systems for non-destructive package mold thickness metrology and time-domain reflectometry, offering improved productivity in semiconductor manufacturing. Advantest’s experts will be available to discuss solutions for SoC, memory, handlers and more.
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