Plasma-Therm acquires Ion-Beam specialist
Wafer process technology solutions company Plasma-Therm has acquired Nano Etch Systems Inc. of California, a developer of ion beam etch (IBE) and ion beam deposition (IBD) systems including the Pinnacle IBE and IBD systems. NES also produces ion beam source and Marathon grid upgrade solutions for existing systems from various manufacturers' to cost-effectively improve performance and extend system life.
"We are pleased to incorporate NES' outstanding technology into our product portfolio," said Plasma CEO Abdul Lateef. "The superior performance of NES Pinnacle systems, coupled with Plasma-Therm's award-winning customer service, make a compelling value proposition for manufacturers in data storage, MEMS, wireless, and other markets."
Pinnacle IBD is said to deliver 24 percent higher throughput than the industry average, and Pinnacle IBE up to 40 percent greater process efficiency than the industry average. Marathon grids used on Pinnacle systems deliver better uniformity and longer life than competing designs, while the proprietary Swift Motion Control of fixture tilt, rotation, and target indexing increases productivity.
Hari Hedge, Ph.D., founder of NES, said the innovative ion beam technology developed by NES will be marketed more effectively under the Plasma-Therm brand. "Plasma-Therm is known throughout the industry for quality and for partnering with customers to drive process
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