Analysis
New order for an MBE research machine in France
RIBER, the global leader for molecular beam epitaxy (MBE), is announcing the sale of a Compact 21 research system to the Lyon Institute of Nanotechnology (INL).
Thiswill contribute towards expanding the Institute's research capabilities for the development of innovative micro and optoelectronic components. More specifically, it will enable to better support researches on the use of a universal substrate, silicon.
INL is a mixed research unit, overseen by the French national center for scientific research (CNRS),
Ecole Centrale de Lyon, INSA de Lyon and Université Lyon 1. INL's mission is to develop research, from
materials to systems, paving the way for the emergence of groundbreaking technological fields.
Applications cover the main economic sectors, from the semiconductor, microelectronic and photonic
industries to telecommunications, energy, health, biology, industrial control, defense and the
environment.
The Compact 21 system sold to INL offers a very high level of modularity and flexibility. Its original design makes it possible to deposit materials with low and high evaporation temperatures simultaneously, which is particularly well-suited for growing crystalline oxides on silicon. Drawing on RIBER's technical experience and the INL's oxide growth expertise, this machine is being integrated into the other RIBER systems in place at the INL, devoted to growing III-V semiconductor- based nanostructures.
The project is being financed with funds from the State-Region planning contract. This new order with a leading laboratory confirms RIBER's core position in the semiconductor research sector. The commercial success achieved by the entire Compact 21 range, the world's top-selling MBE research system, highlights RIBER's expertise in nanotechnologies.