AZO used to determine optimum sputtering method

7th August 2015

Innovnano

Siobhan O'Gorman

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AZO sputtering targets, from Innovnano, provide researchers with a highly optimised and cost-effective tool for the development of next-gen transparent conducting oxide thin films. Recently, these targets have been utilised in a paper published in collaboration with the Centre for Renewable Energy Systems Technology (CREST) that outlines the importance of sputtering methods in thin film production.

Research-grade AZO sputtering targets from Innovnano are formed from a specifically developed range of nanostructured AZO powders that are produced using the company’s patented Emulsion Detonation Synthesis technique. Offering high electrical conductivity, enhanced mechanical and thermal properties and improved target lifetimes, the targets are the ultimate tool for use in thin film research.

Innovnano’s AZO sputtering targets offer a cost-effective solution for the production of thin films of the highest quality. Optimised grain sizes enable uniform heat dispersion during sputtering, which extends the lifetime of the target. Combined with shorter sputtering times, this results in lower thin film production costs for higher-quality end products.

The research paper, presented at the 42nd IEEE Photovoltaic Specialists conference in New Orleans in June, investigates RF and DC sputtering for the deposition of AZO. Pre-doped nanoparticles were hot pressed to form an AZO target with a 2% aluminium dopant concentration. DC and RF sputtering were compared, highlighting DC sputtering as the most applicable technique for industry with its faster deposition rate and optimal film quality.

Patrick Isherwood, a researcher at the CREST Laboratory and lead author on the paper commented, “We always choose to use AZO targets from Innovnano for our research as they consistently produce top quality thin films and are the easiest to use of any AZO target we’ve worked with.”