EV Group (EVG) has announced its participation in the 3D integration consortium of IRT Nanoelec, which is headed by CEA-Leti. EVG joins Leti, STMicroelectronics and Mentor Graphics to develop advanced 3D wafer-to-wafer bonding technologies. SET also joined recently the consortium.

EV Group announced that it has signed a joint-development and licensing agreement with Eulitha AG, a pioneer and leader in the production of high-quality nanostructures using advanced lithography techniques. EVG will integrate Eulitha's PHABLE mask-based ultraviolet (UV) photolithography technology with EVG's automated mask aligner product platform with the goal of developing a low-cost-of-ownership (CoO) nanopatterning solution to enable the pr...

EV Group today announced the EVG620HBL Gen II - the second generation fully automated mask alignment system for volume manufacturing of high-brightness light-emitting diodes (HB-LEDs). Introduced one year after the launch of the first-generation EVG620HBL, the Gen II delivers a tool platform tailored to address HB-LED customer-specific needs and the ongoing demand of total cost-of-ownership reduction. The EVG620HBL Gen II also optimizes tool foo...