STMicroelectronics Joins CEA-Leti IMAGINE Program to Develop Multiple E-Beam Lithography

“STMicroelectronics has been working for more than a decade with CEA-Leti on maskless lithography. Together, ST and CEA-Leti have established a full shaped-beam capability on ST’s Crolles pilot line and demonstrated the insertion of e-beam technology in a standard CMOS process flow,” said Joël Hartmann, Silicon-Technology Development Director for STMicroelectronics, at Crolles, France. “Joining the IMAGINE program is a logical step for ST to get access to a mask-less lithography possible solution for future technology nodes.”

“The IMAGINE program will benefit from the strong knowledge and support of STMicroelectronics in maskless technology,” said Leti’s CEO, Laurent Malier. “The experience of CEA-Leti in e-beam technology has been strengthened over the years by this partnership with ST for using e-beam for advanced technology demonstrators. With STMicroelectronics supporting the IMAGINE program, we are convinced we will succeed to make maskless lithography a viable solution.”

MAPPER’s offices are located in Delft, The Netherlands, near Delft University of Technology; MAPPER is delivering massively parallel electron beam platforms and this equipment delivery is part of the collaboration program.