Analysis
NEC to Begin 40nm Manufacturing
NEC Electronics Corporation today announced plans for the production of semiconductor devices utilizing 40-nanometer process technology at NEC Yamagata, its manufacturing subsidiary in Tsuruoka, Japan. The company is investing 10 billion yen this fiscal year (ending March 31, 2008) toward the purchase of an immersion lithography system and other leading edge equipment that will enable manufacturing of 55-nanometer and 40-nanometer devices. The equipment will be installed at the 300-millimeter wafer production line at NEC Yamagata.
NEC As consumers demand smaller form factors and longer operating times for mobile applications and other electronics, semiconductor companies must deliver devices with higher performance, smaller footprints, lower power consumption features, and lower costs. To achieve these goals, the implementation of advanced process technologies is vital.
Since the launch of 300-millimeter wafer production at NEC Yamagata in January 2005, NEC Electronics has invested 140 billion yen to date for 130-nanometer, 90-nanometer, and 55-nanometer manufacturing at the site. The company has also introduced the use of several low power technologies, such as high-k metal gate stacks, which have helped achieve significant reductions in power consumption and earned high marks from customers.
The additional 10 billion yen investment this fiscal year to upgrade NEC Yamagata's 300mm line will allow production of up to 5,000 wafers per month using 55-nanometer technology, of which approximately 2,000 wafers per month can be adapted for 40-nanometer technology. NEC Yamagata’s total manufacturing capacity, which currently stands at approximately 13,000 wafers per month, will remain unchanged, and the facility will continue to support 130-nanometer and 90-nanometer production.