Analysis
Kyzen to Feature Its Award-Winning Cleaning Chemistries at NEPCON West China 2012
Kyzen announces that it will feature its award-winning LONOX L5611 stencil cleaning chemistry and AQUANOX A4703 neutral pH aqueous cleaning chemistry in booth #B06 at the upcoming NEPCON West China 2012 exhibition and conference. The event is scheduled to take place June 19-21, 2012 at the new International Convention & Exposition Center in Chengdu.
LONOAs an aqueous cleaning solution designed with a pH neutral formulation, AQUANOX A4703 is combined with Kyzen’s inhibition technology to provide superior material compatibility. Additionally, A4703 is effective at concentrations as low as 3 percent, while being environmentally friendly and providing the lowest cost of ownership.
This chemistry was developed for use in spray batch and spray in-line cleaning systems to remove OA, no-clean, and RMA pastes and fluxes, including difficult Pb-free residues. A4703 is easily controlled by refractive index, manually or when using an automated process control system such as the Kyzen PCS.
LONOX L5611 and AQUANOX A4703 are RoHS compliant, Halogen, Halide and Hexane free. These formulations have proven compatible with all materials commonly used in electronics assembly manufacturing and cleaning processes. Additionally, the Kyzen Applications Laboratory has evaluated all these formulations for effective removal of nearly 300 soldering materials from the world’s leading suppliers including, Senju, Alpha, Kester, Indium, Aim, Koki, Nihon Superior, Amtech, Cobar, EFD, Florida Cirtech, Formosa, Heraeus, Interflux, Metallic Resource, Multicore, Promosol, Qualitek and Shenmao.